XPS_Database
Ni的电子结合能：
Energy (eV) Element Chemical bonding Ref
215 869.6Ni2p1/2 Ni
Ni的电子结合能：
Energy (eV) Element Chemical bonding Ref 851.4Ni2p3/2ds le 304 ss avec N2 implanté 218 851.4Ni2p3/2 Ni11 218 851.95Ni2p3/2 AuNi 150 852Ni2p3/2Ni (16 min)/Al2O3/Al 229 852.1Ni2p3/2 Ni 111
métallique 118 852.3Ni2p3/2 Ni
852.4Ni2p3/2 Ni 215 852.48Ni2p3/2 Ni 150 852.5Ni2p3/2 Ni 247 852.5Ni2p3/2Ni métal ( 10puis-6 torr) 78 852.5Ni2p3/2Ni métal ( 250°C -1h ) 78 852.5Ni2p3/2Ni, Ni foil polishing and Ar+ etching 101 852.6Ni2p3/2 NiS 150 852.6Ni2p3/2Ni, Ni foil polish and Ar+ etching, + O2 at 200°C/1h 101 852.6Ni2p3/2Ni, Ni foil polishing + water immersion/28h 101
Ni 229 852.7Ni2p3/2 bulk
metal 13 852.7Ni2p3/2 Ni
852.8Ni2p3/2 Ni2Si 150 852.8Ni2p3/2 Ni-21Cr-8Fe 183 852.8Ni2p3/2 Ni 183 852.8Ni2p3/2Ni° in a passive film on SUS316L 65 852.9Ni2p3/2 Ni2P 150 852.9Ni2p3/2  2 min Ni deposit : Ni dispersed on Al2O3 229 852.9Ni2p3/2Ni, Ni foil polishing and Ar+ etching+H2S 400°C/1h 101 853Ni2p3/2 NiB 150 853Ni2p3/2Ni (7 min)/Al2O3/Al annealed to 800K for 30 min 229 853Ni2p3/2Ni metal with a sample immersed in a 60°C solution 11 853Ni2p3/2Ni metal with a sample immersed in a room t° solution 11 853Ni2p3/2NiS/Ni3S2 -Ni foil polish in H2O/28h+H2S 400°C/1h 101 853Ni2p3/2Ni Polish +Ar+,+O2 -200°C/1h+400°C/2h30mn+H2S 400°C/1h 101 853.1Ni2p3/2NiOads ( 10puis-6 torr) 78 853.1Ni2p3/2NiOads ( air 15min ) 78 853.3Ni2p3/2élément naturel (liaison métallique) 147 853.5Ni2p3/2 NiO 111 853.55Ni2p3/2 Al3Ni 150 853.6Ni2p3/2 NiI2 111 853.9Ni2p3/2 Ni(C5H5)2 111 853.9Ni2p3/2 Ni(PPh3)2 111滕丽名郭政鸿
853.9Ni2p3/2abrasé sur dry 600 grit sandpaper qq sec 207 853.9Ni2p3/2 NiO 118 854Ni2p3/2 Ni2S3 111 854Ni2p3/2 NiO 247 854Ni2p3/2NiO (1er pic) ( 800°C - 10min ) 78 854Ni2p3/2NiO ( 1er pic) ( 800°C-air ) 78 854Ni2p3/2NiO (1er pic ) ( 800°C-air+ O2-10min ) 78 854Ni2p3/2Ni (1 min)/Al2
O3/Al : NiO 229 854.2Ni2p3/2 NiO 150 854.2Ni2p3/2 Ni(Co)4 150 854.2Ni2p3/2 NiO 157 854.4Ni2p3/2Ni(II) dans NiO 183 854.4Ni2p3/2 (Ni(SCH2CH2S))n 235 854.4Ni2p3/2 Ni(SCH2CH2S)(PMe2Ph)2 235 854.5Ni2p3/2 Ni(Co)4 111 854.5Ni2p3/2Ni (16 min)/Al2O3/Al annealed to 800K for 10 min :NiAl 229 854.5Ni2p3/2Ni oxide with a sample immersed in a room t° solution 11 854.5Ni2p3/2 Ni(SPh)2(CyNC)2 235 854.6Ni2p3/2 Ni-(dimethyl-glyoxime)2 150 854.6Ni2p3/2 NiO 155 854.6Ni2p3/2 NiO 13 854.6Ni2p3/2 Ni(SPh)2(dppe) 235 854.6Ni2p3/2 Ni(SPh)2(PMe2Ph)2 235 854.7Ni2p3/2 Ni(CN)2 111 854.7Ni2p3/2 Ni(SCH2CH2S)(dppe) 235 854.7Ni2p3/2 (Ni(SPh)2)n 235 854.8Ni2p3/2 NiCl2(NBu3)2 111 854.9Ni2p3/2 NiS 111 854.9Ni2p3/2 NiBr2 111 854.9Ni2p3/2 Ni(dimethylglyoxime) 111 854.9Ni2p3/2 NiFe2O4 111 855Ni2p3/2voir spectres dans la publication 102 855Ni2p3/2Ni oxide with a sample immersed in a 60°C solution 11 855.3Ni2p3/2 NiCO3 111 855.3Ni2p3/2 USY-A-6 44 855.3Ni2p3/2 LaHY 44 855.3Ni2p3/2 Ni(Met)2 235 855.4Ni2p3/2 Ni(C24H27N7)(PF6)2 111 855.4Ni2p3/2 K2Ni(CN)4 111 855.4Ni2p3/2 NiFe2O4 247 855.4Ni2p3/2 USY-A-8 44 855.5Ni2p3/2 Ni(acac)2 150 855.5Ni2p3/2 Me4NNiCl3 111 855.5Ni2p3/2NiO Oads ( 800°C-air+ O2-10min ) 78 855.5Ni2p3/2 USY-B-8 44 855.6Ni2p3/2 Ni(OH)2 247
855.6Ni2p3/2 Ni(OH)2 118 855.6Ni2p3/2NiOx, Ni foil polishing + water immersion/28h 101 855.7Ni2p3/2 Ni(OH)2 150
acethylacetonate 111 855.7Ni2p3/2 Ni
855.7Ni2p3/2 Ni2O3 13 855.8Ni2p3/2 Ni2O3 150 855.8Ni2p3/2NiO (2nd pic) ( 800°C - 10min ) 78 855.8Ni2p3/2NiO (2ème pic) ( 800°C-air ) 78 855.8Ni2p3/2NiO ( 2ème pic) ( 800°C-air+ O2-10min ) 78 855.8Ni2p3/2Ni(OH)2 dans Inconnel 600 (Publication riche en El) 246 855.8Ni2p3/2NiOx, Ni foil polish and Ar+ etching, + O2 at 200°C/1h 101 855.9Ni2p3/2Ni2O3 ( 10puis-6 torr) 78 855.9Ni2p3/2Ni2O3 (1er pic) ( air 15min ) 78 855.9Ni2p3/2Ni2O3 ( 800°C-air ) 78 855.9Ni2p3/2Ni2O3 ( 800°C-air+ O2-10min ) 78 855.9Ni2p3/2 USY-B-8H 44 856Ni2p3/2 NiAl2O4 150 856Ni2p3/2 Ni(OH)2 111 856Ni2p3/2 Ni2O3 111 856Ni2p3/2NiOx, Ni foil polish-Ar+etch+O2, 200°C/1h+400°C/2h30mn 101 856.1Ni2p3/2 NiCl2 111 856.1Ni2p3/2Ni2O3 (1er pic) ( 250°C -1h ) 78 856.1Ni2p3/2 USY-2 44
风铃
cyclohexanebutyrate 111 856.3Ni2p3/2 Ni
856.3Ni2p3/2 USY-D 44 856.4Ni2p3/2 (NH4)2NiF4 111 856.4Ni2p3/2 Ni(OH)2 13 856.5Ni2p3/2 NiCl2 150 856.6Ni2p3/2 NiSiO4 150 856.7Ni2p3/2 NiSiO3 150 856.8Ni2p3/2 Ni(NO3)2 111
biuret 111 856.8Ni2p3/2 KNi
空间背景音乐怎么弄>于正艺人通话录音trifluoroacetate 111 856.9Ni2p3/2 Ni
856.9Ni2p3/2 LaHY-H2O 44 856.9Ni2p3/2 NiSiO3 155 857Ni2p3/2 NiSO4 111 857.1Ni2p3/2 NiAl2O4 111 857.2Ni2p3/2 NiF2 150 857.2Ni2p3/2 NiWO4 111 857.3Ni2p3/2Metal salt NiCl2 in 316 L alloy 207 857.8Ni2p3/2 NiF2 111 858.5Ni2p3/2Ni métal (10puis-6 torr) 78 858.7Ni2p3/2 NiSiF6 111 860.9Ni2p3/2 K2NiF6 111 861.2Ni2p3/2NiO (3eme pic) ( 800°C - 10min ) 78 861.2Ni2p3/2NiO ( 3ème pic) ( 800°C-air ) 78
861.2Ni2p3/2NiO (3ème pic) ( 800°C-air+ O2-10min ) 78 861.4Ni2p3/2Ni2O3 ( 2eme pic) ( air 15min ) 78 861.4Ni2p3/2Ni2O3 ( 2ème pic ) ( 250°C -1h ) 78
Ni的电子结合能：
lovelyz
Energy (eV) Element Chemical bonding Ref
215
67.4Ni3p1/2 Ni
Ni的电子结合能：
Energy (eV) Element Chemical bonding Ref
215
65.7Ni3p3/2 Ni
247
métal
66.3Ni3p3/2 Ni
247
67.3Ni3p3/2 NiO
247 68Ni3p3/2 Ni(OH)2
247
68.1Ni3p3/2 NiFe2O4
Ni的电子结合能：
Energy (eV) Element Chemical bonding Ref
215 110.2Ni3s Ni
247 110.7Ni3s Ni
247 111.8Ni3s NiO
247 112.7Ni3s Ni(OH)2
听闻远方有你原唱刘艺雯247 113Ni3s NiFe2O4